Name: atomic layer deposition
Price: 256.52 EUR
Availability: InStock
Author: Kääriäinen, Tommi ; Cameron, David ; Kääriäinen, Marja-Leena
ISBN: 9781118062777

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Type

Physical Book

Author

David Cameron

Tommi Kääriäinen

Marja-Leena Kääriäinen

Publisher

Wiley-Scrivener

Language

English

Format

Hardcover

Dimensions

23.6 x 15.5 x 2.3 cm

Weight

0.57 kg.

ISBN

1118062779

ISBN13

9781118062777

Edition No.

0002

Synopsis "atomic layer deposition"

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

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atomic layer deposition - Kääriäinen, Tommi ; Cameron, David ; Kääriäinen, Marja-Leena

Synopsis "atomic layer deposition"

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