Hallo! Tracked shipping to Netherlands with Delivery Duty Paid for just €7 

Ship to
Netherlands
0
  • argentina
  • chile
  • colombia
  • españa
  • méxico
  • perú
  • estados unidos
  • internacional

Select your country

Americas

Europe

Rest of the world

portada Plasma Electronics: Applications in Microelectronic Device Fabrication
Type
Physical Book
Publisher
Language
English
Pages
412
Format
Paperback
ISBN13
9781138034150
Edition No.
0002

Plasma Electronics: Applications in Microelectronic Device Fabrication

Toshiaki Makabe (Author) · Zoran Lj Petrovic (Author) · CRC Press · Paperback

Plasma Electronics: Applications in Microelectronic Device Fabrication - Makabe, Toshiaki ; Petrovic, Zoran Lj

Cheaper New Book Imported to Netherlands
Delivery: 05 Oct - 12 Oct Shipping: 14 to 18 business days.
€ 128,34
Faster New Book Imported to Netherlands
Delivery: 22 Sep - 24 Sep Shipping: 5 to 6 business days.
€ 139,15
Import costs and 9% BTW included in the price ✅
€ 128,34

Synopsis "Plasma Electronics: Applications in Microelectronic Device Fabrication"

Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory. Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date picture of plasma physics, computational methods, applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences. A helpful resource for anyone learning about collisional plasma structure, function, and applications, this edition reflects the latest progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process. Filled with new figures, tables, problems, and exercises, it includes a new chapter on the development of atmospheric-pressure plasma, in particular microcell plasma, with a discussion of its practical application to improve surface efficiency. The book provides an up-to-date discussion of MEMS fabrication and phase transition between capacitive and inductive modes in an inductively coupled plasma. In addition to new sections on the phase transition between the capacitive and inductive modes in an ICP and MOS-transistor and MEMS fabrications, the book presents a new discussion of heat transfer and heating of the media and the reactor. Integrating physics, numerical methods, and practical applications, this book equips you with the up-to-date understanding required to scale up lab breakthroughs into industrial innovations.

Customers reviews

Frequently Asked Questions about the Book

All books in our catalog are Original.
The book is written in English.
The binding of this edition is Paperback.

Questions and Answers about the Book

Do you have a question about the book? Login to be able to add your own question.

Opinions about Bookdelivery

More customer reviews